Signup to have metrics tracked for this article

By signing up, social media discussions about Exploring the optimal combination of Ru/Ta bilayer mask stacks and illumination source shapes to mitigate mask 3D effects at high-NA extreme ultraviolet lithography. will be collected and displayed on PubHawk. We'll also notify you by email on a monthly basis of any new updates captured on platforms like YouTube, Twitter/X, Bluesky, Facebook, LinkedIn, and more.
Your identifiable personal information will never be sold or shared to directly target you.

Please enter a valid email.
You must agree before submitting.

Example of Metrics tracking for this article:

Layout example
Exploring the optimal combination of Ru/Ta bilayer mask stacks and illumination source shapes to mitigate mask 3D effects at high-NA extreme ultraviolet lithography.
Layout example