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Publications by authors named "Dmitrijs Opalevs"

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Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source.
Andreas Vetter, Raoul Kirner, Dmitrijs Opalevs, Matthias Scholz, Patrick Leisching

Opt Express· August 2018


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Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nm.
Raoul Kirner, Andreas Vetter, Dmitrijs Opalevs, Christian Gilfert, Matthias Scholz

Opt Express· January 2018


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1.3-mW tunable and narrow-band continuous-wave light source at 191 nm.
Matthias Scholz, Dmitrijs Opalevs, Patrick Leisching, Wilhelm Kaenders, Guiling Wang

Opt Express· August 2012


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