Publications by authors named "F Holzmeier"

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Pathways to high-performance extreme ultra-violet lithography resists: Dissociative electron attachment to pentafluoro-phenyl triflate.
Mónica Mendes, Reza Tafrishi, Pedro Guerra, Fabian Holzmeier, Oddur Ingólfsson

iScience· December 2025

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Resolving In Situ Exposure Dynamics in a Chemically Amplified EUV Photoresist Using Table-Top EUV Photoemission Spectroscopy.
Dhirendra P Singh, Laura Galleni, Faegheh S Sajjadian, Ivan Pollentier, Fabian Holzmeier

ACS Appl Mater Interfaces· September 2025

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Few-femtosecond electron transfer dynamics in photoionized donor-π-acceptor molecules.
Federico Vismarra, Francisco Fernández-Villoria, Daniele Mocci, Jesús González-Vázquez, Yingxuan Wu, Fabian Holzmeier

Nat Chem· December 2024

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Dissociative photoionization of phenyl triflate, a photoacid generator for photolithography, at 92 eV.
V Laffert, F S Sajjadian, R Richter, M J van Setten, F Holzmeier

J Chem Phys· April 2024

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X-ray induced fragmentation of fulminic acid, HCNO.
Marius Gerlach, Dorothee Schaffner, Tobias Preitschopf, Emil Karaev, John Bozek, Fabian Holzmeier

J Chem Phys· September 2023

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