Publications by authors named "Geumbi Mun"

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Effects of Al Precursors on the Characteristics of Indium-Aluminum Oxide Semiconductor Grown by Plasma-Enhanced Atomic Layer Deposition.
Seunghee Lee, Miso Kim, Geumbi Mun, Jongbeom Ko, Hye-In Yeom

ACS Appl Mater Interfaces· August 2021

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Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application.
Hyo Yeon Kim, Eun Ae Jung, Geumbi Mun, Raphael E Agbenyeke, Bo Keun Park

ACS Appl Mater Interfaces· October 2016

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