Publications by authors named "Matthew T Shaw"

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Fabrication of Graphoepitaxial Gate-All-Around Si Circuitry Patterned Nanowire Arrays Using Block Copolymer Assisted Hard Mask Approach.
Tandra Ghoshal, Ramsankar Senthamaraikannan, Matthew T Shaw, Ross Lundy, Andrew Selkirk

ACS Nano· June 2021

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Area Selective Polymer Brush Deposition.
Cian Cummins, Matthew T Shaw, Michael A Morris

Macromol Rapid Commun· August 2017

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Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymers under solvent annealing.
Tandra Ghoshal, Atul Chaudhari, Cian Cummins, Matthew T Shaw, Justin D Holmes

Soft Matter· June 2016

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Fabrication of ultra-dense sub-10 nm in-plane Si nanowire arrays by using a novel block copolymer method: optical properties.
Tandra Ghoshal, Christos Ntaras, John O'Connell, Matthew T Shaw, Justin D Holmes

Nanoscale· January 2016

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Reduction and control of domain spacing by additive inclusion: morphology and orientation effects of glycols on microphase separated PS-b-PEO.
Tandra Ghoshal, Matthew T Shaw, Justin D Holmes, Michael A Morris

J Colloid Interface Sci· July 2015

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Fabrication of ordered, large scale, horizontally-aligned si nanowire arrays based on an in situ hard mask block copolymer approach.
Tandra Ghoshal, Ramsankar Senthamaraikannan, Matthew T Shaw, Justin D Holmes, Michael A Morris

Adv Mater· February 2014

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Size and space controlled hexagonal arrays of superparamagnetic iron oxide nanodots: magnetic studies and application.
Tandra Ghoshal, Tuhin Maity, Ramsankar Senthamaraikannan, Matthew T Shaw, Patrick Carolan

Sci Rep· September 2013

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The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditions.
Dipu Borah, Sozaraj Rasappa, Ramsankar Senthamaraikannan, Matthew T Shaw, Justin D Holmes

J Colloid Interface Sci· March 2013

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Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systems.
Dipu Borah, Mustafa Ozmen, Sozaraj Rasappa, Matthew T Shaw, Justin D Holmes

Langmuir· March 2013

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Sub-10 nm feature size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal process.
Dipu Borah, Matthew T Shaw, Justin D Holmes, Michael A Morris

ACS Appl Mater Interfaces· March 2013

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Fabrication of a sub-10 nm silicon nanowire based ethanol sensor using block copolymer lithography.
Sozaraj Rasappa, Dipu Borah, Colm C Faulkner, Tarek Lutz, Matthew T Shaw

Nanotechnology· February 2013

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Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry.
Dipu Borah, Sozaraj Rasappa, Ramsankar Senthamaraikannan, Barbara Kosmala, Matthew T Shaw

ACS Appl Mater Interfaces· January 2013

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"In situ" hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays.
Tandra Ghoshal, Ramsankar Senthamaraikannan, Matthew T Shaw, Justin D Holmes, Michael A Morris

Nanoscale· December 2012

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Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly.
Richard A Farrell, Niall T Kinahan, Stefan Hansel, Karl O Stuen, Nikolay Petkov, Matthew T Shaw

Nanoscale· May 2012

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Surface-directed dewetting of a block copolymer for fabricating highly uniform nanostructured microdroplets and concentric nanorings.
Richard A Farrell, Nikolaos Kehagias, Matthew T Shaw, Vincent Reboud, Marc Zelsmann

ACS Nano· February 2011

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Study on the combined effects of solvent evaporation and polymer flow upon block copolymer self-assembly and alignment on topographic patterns.
Thomas G Fitzgerald, Richard A Farrell, Nikolay Petkov, Ciara T Bolger, Matthew T Shaw

Langmuir· December 2009

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Synthesis and characterization of highly ordered cobalt-magnetite nanocable arrays.
Brian Daly, Donna C Arnold, Jaideep S Kulkarni, Olga Kazakova, Matthew T Shaw

Small· November 2006

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