Publications by authors named "Niklas Huster"

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Self-reducing precursors for aluminium metal thin films: evaluation of stable aluminium hydrides for vapor phase aluminium deposition.
Niklas Huster, Rita Mullins, Michael Nolan, Anjana Devi

Dalton Trans· May 2024

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SnO deposition water based ALD employing tin(II) formamidinate: precursor characterization and process development.
Niklas Huster, Ramin Ghiyasi, David Zanders, Detlef Rogalla, Maarit Karppinen

Dalton Trans· October 2022

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Additive-free spin coating of tin oxide thin films: synthesis, characterization and evaluation of tin β-ketoiminates as a new precursor class for solution deposition processes.
Niklas Huster, David Zanders, Sarah Karle, Detlef Rogalla, Anjana Devi

Dalton Trans· August 2020

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PEALD of HfO Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases.
David Zanders, Engin Ciftyurek, Ersoy Subaşı, Niklas Huster, Claudia Bock

ACS Appl Mater Interfaces· August 2019

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