Publications by authors named "Tony Schenk"

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Demonstration of 1 V Reliable FeRAM Operation: Engineering Using Quasi-Chirality of HfZrO in a Nanolaminate Structure.
Hojung Jang, Alireza Kashir, Tony Schenk, Mostafa Habibi, Martin Schuster

ACS Appl Mater Interfaces· October 2024

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Quantification of the Electromechanical Measurements by Piezoresponse Force Microscopy.
Pratyush Buragohain, Haidong Lu, Claudia Richter, Tony Schenk, Pamenas Kariuki

Adv Mater· November 2022

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Fluid Imprint and Inertial Switching in Ferroelectric La:HfO Capacitors.
Pratyush Buragohain, Adam Erickson, Pamenas Kariuki, Terence Mittmann, Claudia Richter, Tony Schenk

ACS Appl Mater Interfaces· September 2019

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Genuinely Ferroelectric Sub-1-Volt-Switchable Nanodomains in Hf ZrO Ultrathin Capacitors.
Igor Stolichnov, Matteo Cavalieri, Enrico Colla, Tony Schenk, Terence Mittmann

ACS Appl Mater Interfaces· September 2018

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Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material.
Uwe Schroeder, Claudia Richter, Min Hyuk Park, Tony Schenk, Milan Pešić

Inorg Chem· March 2018

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Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment.
Min Hyuk Park, Young Hwan Lee, Han Joon Kim, Tony Schenk, Woongkyu Lee

Nanoscale· July 2017

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Complex Internal Bias Fields in Ferroelectric Hafnium Oxide.
Tony Schenk, Michael Hoffmann, Johannes Ocker, Milan Pešić, Thomas Mikolajick

ACS Appl Mater Interfaces· September 2015

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Dynamic leakage current compensation revisited.
Tony Schenk, Uwe Schroeder, Thomas Mikolajick

IEEE Trans Ultrason Ferroelectr Freq Control· March 2015

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Ferroelectricity in Si-doped HfO2 revealed: a binary lead-free ferroelectric.
Dominik Martin, Johannes Müller, Tony Schenk, Thomas M Arruda, Amit Kumar

Adv Mater· December 2014

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Electric field cycling behavior of ferroelectric hafnium oxide.
Tony Schenk, Uwe Schroeder, Milan Pešić, Mihaela Popovici, Yuriy V Pershin

ACS Appl Mater Interfaces· November 2014

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Improving feature size uniformity from interference lithography systems with non-uniform intensity profiles.
En-Chiang Chang, David Mikolas, Pao-Te Lin, Tony Schenk, Chien-Li Wu

Nanotechnology· November 2013

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