Publications by authors named "Torsten Feigl"

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XUV double-pulses with femtosecond to 650 ps separation from a multilayer-mirror-based split-and-delay unit at FLASH.
Mario Sauppe, Dimitrios Rompotis, Benjamin Erk, Sadia Bari, Tobias Bischoff, Torsten Feigl

J Synchrotron Radiat· September 2018

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Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources.
Marcus Trost, Sven Schröder, Angela Duparré, Stefan Risse, Torsten Feigl

Opt Express· November 2013

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An extreme ultraviolet Michelson interferometer for experiments at free-electron lasers.
Vinzenz Hilbert, Alexander Blinne, Silvio Fuchs, Torsten Feigl, Tino Kämpfer

Rev Sci Instrum· September 2013

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Influence of the substrate finish and thin film roughness on the optical performance of Mo/Si multilayers.
Marcus Trost, Sven Schröder, Torsten Feigl, Angela Duparré, Andreas Tünnermann

Appl Opt· March 2011

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Extreme-ultraviolet-induced oxidation of Mo/Si multilayers.
Nicolas Benoit, Sven Schröder, Sergiy Yulin, Torsten Feigl, Angela Duparré

Appl Opt· July 2008

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EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates.
Sven Schröder, Torsten Feigl, Angela Duparré, Andreas Tünnermann

Opt Express· October 2007

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Chromium-scandium multilayer mirrors for the nitrogen K(alpha) line in the water window region.
Thomas Kuhlmann, Sergey Yulin, Torsten Feigl, Norbert Kaiser, Tatiana Gorelik

Appl Opt· April 2002

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