Publications by authors named "Inho Seong"

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C
Characterization of SiO Plasma Etching with Perfluorocarbon (CF and CF) and Hydrofluorocarbon (CHF and CHF) Precursors for the Greenhouse Gas Emissions Reduction.
Minsu Choi, Youngseok Lee, Yebin You, Chulhee Cho, Wonnyoung Jeong, Inho Seong

Materials (Basel)· August 2023

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Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma.
Inho Seong, Sijun Kim, Minsu Choi, Woobeen Lee, Wonnyoung Jeong

Materials (Basel)· August 2023

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C
Contribution of Ion Energy and Flux on High-Aspect Ratio SiO Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/CF Plasma: Individual Ion Energy and Flux Controlled.
Wonnyoung Jeong, Sijun Kim, Youngseok Lee, Chulhee Cho, Inho Seong

Materials (Basel)· May 2023

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On the Quenching of Electron Temperature in Inductively Coupled Plasma.
Inho Seong, Si-Jun Kim, Youngseok Lee, Chulhee Cho, Wonnyoung Jeong

Materials (Basel)· April 2023

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Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method.
Chulhee Cho, Sijun Kim, Youngseok Lee, Inho Seong, Wonnyoung Jeong

Materials (Basel)· March 2023

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D
Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process.
Si-Jun Kim, Min-Su Choi, Sang-Ho Lee, Won-Nyoung Jeong, Young-Seok Lee, In-Ho Seong

Sensors (Basel)· February 2023

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Observation of prior light emission before arcing development in a low-temperature plasma with multiple snapshot analysis.
Si-Jun Kim, Young-Seok Lee, Chul-Hee Cho, Min-Su Choi, In-Ho Seong

Sci Rep· December 2022

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I
Investigation into SiO Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled.
Won-Nyoung Jeong, Young-Seok Lee, Chul-Hee Cho, In-Ho Seong, Shin-Jae You

Nanomaterials (Basel)· December 2022

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C
Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma.
Inho Seong, Jinho Lee, Sijun Kim, Youngseok Lee, Chulhee Cho

Nanomaterials (Basel)· November 2022

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Influence of Additive N on O Plasma Ashing Process in Inductively Coupled Plasma.
Ye-Bin You, Young-Seok Lee, Si-Jun Kim, Chul-Hee Cho, In-Ho Seong

Nanomaterials (Basel)· October 2022

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D
Development of a High-Linearity Voltage and Current Probe with a Floating Toroidal Coil: Principle, Demonstration, Design Optimization, and Evaluation.
Si-Jun Kim, In-Ho Seong, Young-Seok Lee, Chul-Hee Cho, Won-Nyoung Jeong

Sensors (Basel)· August 2022

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L
Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO.
Youngseok Lee, Sijun Kim, Jangjae Lee, Chulhee Cho, Inho Seong

Sensors (Basel)· August 2022

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D
Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath.
Inho Seong, Sijun Kim, Youngseok Lee, Chulhee Cho, Jangjae Lee

Sensors (Basel)· August 2022

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R
Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma.
Chulhee Cho, Sijun Kim, Youngseok Lee, Wonnyoung Jeong, Inho Seong

Sensors (Basel)· August 2022

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D
Development of the Measurement of Lateral Electron Density (MOLE) Probe Applicable to Low-Pressure Plasma Diagnostics.
Si-Jun Kim, Sang-Ho Lee, Ye-Bin You, Young-Seok Lee, In-Ho Seong

Sensors (Basel)· July 2022

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