Publications by authors named "Uwe Zeitner"

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Wafer-scale nanofabrication of sub-5 nm gaps in plasmonic metasurfaces.
Jeetendra Gour, Sebastian Beer, Pallabi Paul, Alessandro Alberucci, Michael Steinert, Uwe Detlef Zeitner

Nanophotonics· September 2024

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Mid-infrared dielectric laser acceleration in a silicon dual pillar structure.
Leon Brückner, Tomáš Chlouba, Yuya Morimoto, Norbert Schönenberger, Tatsunori Shibuya, Uwe D Zeitner

Opt Express· July 2024

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Structured illumination ptychography and at-wavelength characterization with an EUV diffuser at 13.5 nm wavelength.
Wilhelm Eschen, Chang Liu, Michael Steinert, Daniel S Penagos Molina, Thomas Siefke, Uwe D Zeitner

Opt Express· January 2024

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Antireflection Structures for VIS and NIR on Arbitrarily Shaped Fused Silica Substrates with Colloidal Polystyrene Nanosphere Lithography.
David Schmelz, Guobin Jia, Thomas Käsebier, Jonathan Plentz, Uwe Detlef Zeitner

Micromachines (Basel)· June 2023

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Design of computer-generated holograms based on semi-rigorous simulations of sub-wavelength structures.
Sebastian Linß, Uwe D Zeitner

Opt Express· March 2023

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Enhancement of third harmonic generation induced by surface lattice resonances in plasmonic metasurfaces.
Jeetendra Gour, Sebastian Beer, Alessandro Alberucci, Uwe D Zeitner, Stefan Nolte

Opt Lett· November 2022

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Optical properties of black silicon structures ALD-coated with AlO.
David Schmelz, Kristin Gerold, Thomas Käsebier, Natali Sergeev, Adriana Szeghalmi, Uwe D Zeitner

Nanotechnology· October 2022

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Second harmonic generation under doubly resonant lattice plasmon excitation.
Sebastian Beer, Jeetendra Gour, Alessandro Alberucci, Christin David, Stefan Nolte, Uwe D Zeitner

Opt Express· October 2022

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Direct growth of monolayer MoS on nanostructured silicon waveguides.
Athira Kuppadakkath, Emad Najafidehaghani, Ziyang Gan, Alessandro Tuniz, Gia Quyet Ngo, Uwe Zeitner

Nanophotonics· September 2022

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Analysis of iterative design algorithms for achromatic deterministic diffusers.
Georg Widholz, Uwe Zeitner

Appl Opt· September 2022

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Ultrafast farfield simulation of non-paraxial computer generated holograms.
Sebastian Linss, Dirk Michaelis, Uwe D Zeitner

Opt Express· April 2022

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Macroscopic wave-optical simulation of dielectric metasurfaces.
Sebastian Linss, Dirk Michaelis, Uwe D Zeitner

Opt Express· March 2021

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Quasi-bound states in the continuum for deep subwavelength structural information retrieval for DUV nano-optical polarizers.
Thomas Siefke, Carol B Rojas Hurtado, Johannes Dickmann, Walter Dickmann, Tim Käseberg, Uwe Zeitner

Opt Express· August 2020

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Mid-infrared long-pass filter for high-power applications based on grating diffraction.
Daniel Gerz, Wolfgang Schweinberger, Thomas Patrick Butler, Thomas Siefke, Martin Heusinger, Uwe Zeitner

Opt Lett· June 2019

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Diffuse scattering due to stochastic disturbances of 1D-gratings on the example of line edge roughness.
Martin Heusinger, Dirk Michaelis, Thomas Flügel-Paul, Uwe D Zeitner

Opt Express· October 2018

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Line-edge roughness as a challenge for high-performance wire grid polarizers in the far ultraviolet and beyond.
Thomas Siefke, Martin Heusinger, Carol B Rojas Hurtado, Johannes Dickmann, Uwe Zeitner

Opt Express· July 2018

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175  nm period grating fabricated by i-line proximity mask-aligner lithography.
Yannick Bourgin, Daniel Voigt, Thomas Käsebier, Thomas Siefke, Ernst-Bernhard Kley, Uwe D Zeitner

Opt Lett· October 2017

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Comparison of hyperspectral imaging spectrometer designs and the improvement of system performance with freeform surfaces.
Chang Liu, Christoph Straif, Thomas Flügel-Paul, Uwe D Zeitner, Herbert Gross

Appl Opt· August 2017

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Rowland ghost suppression in high efficiency spectrometer gratings fabricated by e-beam lithography.
Martin Heusinger, Michael Banasch, Uwe D Zeitner

Opt Express· March 2017

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Temporally-stable active precision mount for large optics.
Claudia Reinlein, Christoph Damm, Nicolas Lange, Andreas Kamm, Matthias Mohaupt, Uwe Zeitner

Opt Express· June 2016

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Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography.
Yannick Bourgin, Thomas Siefke, Thomas Käsebier, Pascal Genevée, Adriana Szeghalmi, Uwe D Zeitner

Opt Express· June 2015

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152 W average power Tm-doped fiber CPA system.
Fabian Stutzki, Christian Gaida, Martin Gebhardt, Florian Jansen, Andreas Wienke, Uwe Zeitner

Opt Lett· August 2014

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250  nm period grating transferred by proximity i-line mask-aligner lithography.
Yannick Bourgin, Thomas Käsebier, Uwe D Zeitner

Opt Lett· March 2014

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Pulse compression grating fabrication by diffractive proximity photolithography.
Lorenz Stuerzebecher, Frank Fuchs, Torsten Harzendorf, Uwe D Zeitner

Opt Lett· February 2014

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Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources.
Marcus Trost, Sven Schröder, Angela Duparré, Stefan Risse, Torsten Feigl, Uwe D Zeitner

Opt Express· November 2013

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