Publications by authors named "Shinjae You"

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On Encapsulated Dielectric Barrier Discharge Plasma Sources for Radar Cross Section Reduction in Mobile Environments.
Minsu Choi, Shin-Jae You, Jinwoo Jung, Changseok Cho, Yongshik Lee, Cheonyoung Kim, Youbin Seol

Sensors (Basel)· November 2023

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Role of Oxygen in Amorphous Carbon Hard Mask Plasma Etching.
Hee-Jung Yeom, Min Young Yoon, Daehan Choi, Youngseok Lee, Jung-Hyung Kim, Shin-Jae You

ACS Omega· September 2023

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Characterization of SiO Plasma Etching with Perfluorocarbon (CF and CF) and Hydrofluorocarbon (CHF and CHF) Precursors for the Greenhouse Gas Emissions Reduction.
Minsu Choi, Youngseok Lee, Yebin You, Chulhee Cho, Wonnyoung Jeong, Youbin Seol, Shinjae You, Geun Young Yeom

Materials (Basel)· August 2023

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Compensation of Heat Effect in Dielectric Barrier Discharge (DBD) Plasma System for Radar Cross-Section (RCS) Reduction.
Jinwoo Jung, Changseok Cho, Minsu Choi, Shinjae You, Jungje Ha, Cheonyoung Kim, Ilyoung Oh

Sensors (Basel)· August 2023

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Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma.
Inho Seong, Sijun Kim, Minsu Choi, Woobeen Lee, Wonnyoung Jeong, Yebin You, Youngseok Lee, Youbin Seol, Shinjae You

Materials (Basel)· August 2023

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C
Contribution of Ion Energy and Flux on High-Aspect Ratio SiO Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/CF Plasma: Individual Ion Energy and Flux Controlled.
Wonnyoung Jeong, Sijun Kim, Youngseok Lee, Chulhee Cho, Inho Seong, Yebin You, Youbin Seol, Shinjae You

Materials (Basel)· May 2023

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Study on OH Radical Production Depending on the Pulse Characteristics in an Atmospheric-Pressure Nanosecond-Pulsed Plasma Jet.
Youbin Seol, Minsu Choi, Hongyoung Chang, Shinjae You

Materials (Basel)· May 2023

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On the Quenching of Electron Temperature in Inductively Coupled Plasma.
Inho Seong, Si-Jun Kim, Youngseok Lee, Chulhee Cho, Wonnyoung Jeong, Yebin You, Shinjae You

Materials (Basel)· April 2023

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Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method.
Chulhee Cho, Sijun Kim, Youngseok Lee, Inho Seong, Wonnyoung Jeong, Yebin You, Shinjae You

Materials (Basel)· March 2023

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Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process.
Si-Jun Kim, Min-Su Choi, Sang-Ho Lee, Won-Nyoung Jeong, Young-Seok Lee, Shin-Jae You

Sensors (Basel)· February 2023

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Observation of prior light emission before arcing development in a low-temperature plasma with multiple snapshot analysis.
Si-Jun Kim, Young-Seok Lee, Chul-Hee Cho, Min-Su Choi, In-Ho Seong, Shin-Jae You

Sci Rep· December 2022

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Investigation into SiO Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled.
Won-Nyoung Jeong, Young-Seok Lee, Chul-Hee Cho, In-Ho Seong, Shin-Jae You

Nanomaterials (Basel)· December 2022

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Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma.
Inho Seong, Jinho Lee, Sijun Kim, Youngseok Lee, Chulhee Cho, Wonnyoung Jeong, Yebin You, Shinjae You

Nanomaterials (Basel)· November 2022

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Comprehensive Assessments in Bonding Energy of Plasma Assisted Si-SiO Direct Wafer Bonding after Low Temperature Rapid Thermal Annealing.
Youngseok Lee, Yebin You, Chulhee Cho, Sijun Kim, Jangjae Lee, Minyoung Kim, Youngjun You, ShinJae You

Micromachines (Basel)· October 2022

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Influence of Additive N on O Plasma Ashing Process in Inductively Coupled Plasma.
Ye-Bin You, Young-Seok Lee, Si-Jun Kim, Chul-Hee Cho, In-Ho Seong, Won-Nyoung Jeong, Shin-Jae You

Nanomaterials (Basel)· October 2022

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Database Development of SiO Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe.
Youngseok Lee, Heejung Yeom, Daehan Choi, Sijun Kim, Jangjae Lee, ShinJae You

Nanomaterials (Basel)· October 2022

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Development of a High-Linearity Voltage and Current Probe with a Floating Toroidal Coil: Principle, Demonstration, Design Optimization, and Evaluation.
Si-Jun Kim, In-Ho Seong, Young-Seok Lee, Chul-Hee Cho, Won-Nyoung Jeong, Ye-Bin You, Shin-Jae You

Sensors (Basel)· August 2022

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Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO.
Youngseok Lee, Sijun Kim, Jangjae Lee, Chulhee Cho, Inho Seong, Shinjae You

Sensors (Basel)· August 2022

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Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath.
Inho Seong, Sijun Kim, Youngseok Lee, Chulhee Cho, Jangjae Lee, Wonnyoung Jeong, Yebin You, Shinjae You

Sensors (Basel)· August 2022

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Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma.
Chulhee Cho, Sijun Kim, Youngseok Lee, Wonnyoung Jeong, Inho Seong, Yebin You, Shinjae You

Sensors (Basel)· August 2022

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Development of the Measurement of Lateral Electron Density (MOLE) Probe Applicable to Low-Pressure Plasma Diagnostics.
Si-Jun Kim, Sang-Ho Lee, Ye-Bin You, Young-Seok Lee, In-Ho Seong, Shin-Jae You

Sensors (Basel)· July 2022

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Crossing Frequency Method Applicable to Intermediate Pressure Plasma Diagnostics Using the Cutoff Probe.
Si-Jun Kim, Jang-Jae Lee, Young-Seok Lee, Chul-Hee Cho, Shin-Jae You

Sensors (Basel)· February 2022

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Plasma Generator with Dielectric Rim and FSS Electrode for Enhanced RCS Reduction Effect.
Taejoo Oh, Changseok Cho, Wookhyun Ahn, Jong-Gwan Yook, Jangjae Lee, Shinjae You, Heung-Cheol You

Sensors (Basel)· December 2021

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Characterization of SiO Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas.
Chulhee Cho, Kwangho You, Sijun Kim, Youngseok Lee, Jangjae Lee, Shinjae You

Materials (Basel)· September 2021

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Impact of Plasma Electron Flux on Plasma Damage-Free Sputtering of Ultrathin Tin-Doped Indium Oxide Contact Layer on -GaN for InGaN/GaN Light-Emitting Diodes.
Kwang Jeong Son, Tae Kyoung Kim, Yu-Jung Cha, Seung Kyu Oh, Shin-Jae You, Jae-Hyun Ryou

Adv Sci (Weinh)· February 2018

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